发明名称 Semiconductor structure tolerant to ionizing radiation.
摘要 <p>A radiation tolerant semiconductor structure comprising a plurality of active field effect transistor portions (12, 18) electrically insulated by an insulating structure (25). The insulating structure comprises a plurality of insulating layers (26, 27). The number of these layers and their selective dielectric constants and thicknesses are chosen to reduce the effect of ionizing radiation on the electrical insulation of the active field effect transistor portions.</p>
申请公布号 EP0115035(A2) 申请公布日期 1984.08.08
申请号 EP19830112888 申请日期 1983.12.21
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 COTTRELL, PETER EDWIN;GARNACHE, RICHARD RAYMOND;GEIPEL, HENRY JOHN, JR.;TROUTMAN, RONALD ROY
分类号 H01L29/78;H01L21/31;H01L21/76;H01L23/29;H01L23/552;(IPC1-7):01L23/54;01L23/28 主分类号 H01L29/78
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