发明名称 METHOD FOR DETERMINING CONCENTRATION OF ORGANIC ADDITIVE IN COPPER ELECTROPLATING BATH
摘要 The concentration of an organic additive in a plating bath is determined by providing a polished and constant current density preplated rotating disc cathode, a reference electrode and anode in an electrolytic copper plating bath, passing an electric current from the anode to the cathode and reference electrode; measuring the voltage difference between the cathode and reference electrode; and comparing the difference to values for known concentrations of the organic additive.
申请公布号 JPS59137853(A) 申请公布日期 1984.08.08
申请号 JP19830180859 申请日期 1983.09.30
申请人 INTERN BUSINESS MACHINES CORP 发明人 PAAMINDAA ESU BINDORA;ARAN PII DEEBITSUDO;REIMONDO TEI GIYARASUKO;DEEBITSUDO ENU RAITO
分类号 G01N27/416 主分类号 G01N27/416
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