| 摘要 |
PURPOSE:To reduce an exposed silicon-substrate surface to which beams directly collide, to inhibit an intrusion of beams and to minimize optical leakage currents by constituting two power supply lines so as to pass through between each of adjacent picture element electrodes. CONSTITUTION:A power supply line (VSS)48 wired in a P well is shared by picture elements 46, 47, picture elements 47, 49 have similar relationship, and a power supply line (VDD) wired on an N type substrate is also shared. The power supply lines 48, 50 are made of first layer aluminum, and designed so that both ends of the power supply lines are superposed on picture electrodes and picture electrodes in the lower sections of clearances among these electrodes. Aluminum films 51 exclusive for shielding beams formed by first layer aluminum are formed, and beams are projected to the silicon substrate only at two sections 52, 53. Structure among the picture elements are formed to a recessed shape because beams projected from the oblique direction reach a substrate surface when a superposition 64 among the picture element electrodes 61, 62 and a lower wiring 63 is small, and the electrodes are arranged so that the ends of the picture element electrodes reach to the recessed section. |
