| 摘要 |
PURPOSE:To obtain a thin film with a sufficient film thickness by even a light irradiation time is short by a method wherein a pattern of a product is formed on a substrate by an irradiation of the light with a wavelength by which a reaction is triggered on an adsorbed substrate. CONSTITUTION:A valve 1 is opened and the inside air of a vacuum cell 2 is completely evacuated by a vacuum pump system P. Then a valve 3 is opened and vapor is introduced into the cell 2 from a sink 4 in which a material for a vapor source is contained. Then liquid nitrogen is introduced from a liquid nitrogen inlet 5 and an Si substrate 6 is cooled. A solid W(CO)6 film is produced on the surface of the substrate 6 as time passes. The substrate 6 is irradiated by a laser beam L to trigger a dissociation reaction and a W pattern is formed as a product. With this constitution, very efficient reaction efficiency can be expected and the efficiency of the light is high because the light beam is irradiated directly to the solid reaction material. |
