Method of forming a capacitor on a substrate.

摘要

For forming a capacitor on a substrate an amorphous thin film layer (17) of a ferroelectric forming titanate or zirconate is deposited on a bottom electrode (13). A leakage current preventing dielectric layer (18) is deposited on the amorphous thin film layer (17) and laser annealed to a crystalline ferroelectric. The leakage current preventing dielectric layer (18) may also serve as an antireflective coating for the titanate or zirconate layer so that better coupling of the laser energy to the titanate or zirconate layer is obtained. The capacitor is completed by depositing a top electrode (15) on the crystalline ferroelectric.