| 发明名称 |
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| 摘要 |
PURPOSE:To permit continuous injection of impurities without breaking the vacuum of an ion injector by subjecting a gas mixture containing impurities of different kinds to mass analysis at the time when such impurities are poured into a semiconductor substrate by ion injection. |
| 申请公布号 |
JPS5931175(B2) |
申请公布日期 |
1984.07.31 |
| 申请号 |
JP19760094661 |
申请日期 |
1976.08.09 |
| 申请人 |
FUJITSU LTD |
发明人 |
TOGEI YOSHIIKU;MATSUMOTO TAKASHI;IWAI TAKASHI;YAMAOKA SHIGERU |
| 分类号 |
H01J37/317;H01J37/30;H01L21/265;H01L21/68 |
主分类号 |
H01J37/317 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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