| 摘要 |
PURPOSE:To reduce the variance of size extending over the whole on a substrate to be treated, and to improve the accuracy of a pattern by cooling a resist film by lowering the temperature of the film while bringing the whole film to a uniform temperature. CONSTITUTION:A substrate 1 to which a pre-baking is completed is shifted to a belt conveyor 9, and carried and introduced to a cooling mechanism 10. The substrate 1 is transferred to a carrier mechanism 11 movable vertically and left and right, dipped in pure water 13 in a cooling tank 12, and cooled uniformly. The cooled substrate 1 is shifted on a belt conveyor 14 by the carrier mechanism 11, and placed on a rotary sample base 15 for spin drying. The substrate 1 dried by the revolution of the sample base 15 is transferred on a belt conveyor 17 by a vacuum chuck 16, and carried out. |
