发明名称 PHOTOCHEMICAL VAPOR DEPOSITION DEVICE
摘要 PURPOSE:To deposit by evaporation reactant on a substrate having a large area by evacuating the inside of a lamp body which is provided on the outside of a reaction vessel under reduced pressure having a transmission window for UV light and is juxtaposed with UV lamp thereby increasing the area of the transmission window and decreasing the thickness of the plate. CONSTITUTION:A substrate 4 is provided in a reaction vessel 1, and a UV transmission window 14 is provided atop the same. A lamp body 2 juxtaposed with plural pieces of UV lamps 3 is integrally and successively provided in the upper part of the window 14. The inside of the body 2 and the vessel 1 is evacuated and photoreactive gas is passed in the vessel 1. A voltage is impressed while the potential difference between the above-mentioned adjacent lamps 3 is the discharge breakdown voltage or below, by which UV light is generated. The pressure difference at the window 14 is decreased by the above-mentioned method, and since the increase in the area of the window 14 and the reduction in the thickness of the plate are made possible, the reactant is deposited by evaporation on the substrate 4 having a large area.
申请公布号 JPS59129770(A) 申请公布日期 1984.07.26
申请号 JP19830005264 申请日期 1983.01.18
申请人 USHIO DENKI KK 发明人 TANAKA KAZUYA;YAMAMOTO TOSHIHIRO
分类号 C23C16/48;G03G5/08 主分类号 C23C16/48
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