| 摘要 |
PURPOSE:To obtain an iron oxide group see-through mask excellent in chemical resistance and wear resistance by mixing tin oxide with an iron oxide film in a see-through mask for exposure. CONSTITUTION:A mask for exposure is made by using a substrate of soda glass, silica glass, etc., covering the whole surface with the base of iron oxide doped by tin oxide at about 400Angstrom -500Angstrom , and etching to a specified pattern by photolithography. The minimum value of film thickness is determined by proportion of mixing of iron oxide with tin oxide, and the transmittivity to ultraviolet ray of 360nm is made to 25% or less. The proportion of doping of tin oxide to iron oxide is selected according to optical transmittivity, chemical resistance and wear resistance, and 5mol%-50mol% is preferable. If 5% or less, chemical wearance becomes poor, and if 50% or more, the transmittivity becomes inferior. Desirably, 15mol%-25mol% is appropriate. |
