发明名称 |
APPARATUS FOR PROJECTING A SERIES OF IMAGES ONTO DIES OF A SEMICONDUCTOR WAFER |
摘要 |
<p>Apparatus for Projecting a Series of Images Onto Dies of a Semiconductor Wafer The apparatus forms one-to-one reticle images on a wafer. The apparatus includes means for holding a reticle containing an image pattern corresponding to the size of the desired wafer pattern. An illumination system substantially uniformly illuminates the reticle pattern. A one-to-one stationary projection optical system projects an image of the reticle pattern onto a predetermined focal plane. Suitable means such as a vacuum chuck holds the wafer. An alignment system steps and orients a wafer chuck to register markings on the individual sides of the wafer with corresponding markings on the reticle. A fluid servo system acts on the chuck to hold at least a portion of the wafer in the predetermined focal plane of the projection optical system.</p> |
申请公布号 |
CA1171555(A) |
申请公布日期 |
1984.07.24 |
申请号 |
CA19820402964 |
申请日期 |
1982.05.14 |
申请人 |
GENERAL SIGNAL CORPORATION |
发明人 |
HERSHEL, RONALD S. |
分类号 |
G03F7/20;G03F9/00;G03F9/02;(IPC1-7):H01L21/70;G02B17/08 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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