MANUFACTURE OF COLOR SOLID-STATE IMAGE PICKUP ELEMENT

摘要

PURPOSE:To remove the absorption and reflection of light and the reduction of transmitted light due to an intermediate protective film and a resist mask, and to improve spectral characteristics by using polymethacrylate containing fluorine as the principal ingredient of a positive type resist and employing an isoindolinone group pigment. CONSTITUTION:A compound mainly comprising a methacrylate polymerization unit containing fluorine shown in the formula I (R1 and R2 are hydrogen or alkyl groups and R3 is an alkyl group in which at least one fluorine is combined with each carbon) is used as the positive type resist. The isoindolinone group pigment shown in the formula II (R is various groups or elements) is employed. The positive type resist is dissolved in a predetermined solvent and changed into a solution of proper viscosity as processes. The resist mask 3 is formed by applying the solution as a resist film 2 on a wafer 1 by using a spinner, etc. in the desired wafer and developing the film 2. An isoindolinone group pigment layer 4 having necessary spectral characteristics is formed on the resist mask 3 through evaporation. Only the resist mask is dissolved or dipped in the solvent exfoliated from a substrate.