| 摘要 |
PURPOSE:To provide automation of a series of the ion implantation processes, by adapting the door of the rocker chamber to be opened in accordance with the movement of the shifting device which is movable back and forth and the movement of the rocking device which becomes operable to make a rocking motion when the shifting device makes a backward movement, whereby the disk on the inside of the door is automatically taken out downward and mounted on the wafer exchanging device for the next process. CONSTITUTION:When the disk 3 with a wafer 4 which has gone throgh with ion implantation is carried into the rocker chamber 9 by the disk carriage 8 and engaged with the chuck 12, the pressure in the rocker chamber 9 which has been shut up by the gate valve 10 becomes atmospheric pressure, and the cylinder 21 of the shifting device 14 which has so far been pushing the door 11 is contracted to cause the carriage 20 to retreat. When the carriage 20 retreats, the door 11 becomes operable to rock. Then, the rocking cylinder of the rocking device 15 is extended, whereby the front end of the rocking frame 25 to which the carriage 20 is attached is caused to rock downward, and, as a result, the door 11 and the disk 3 on the inside of the door is brought to the position substantially on the same level above the drive shaft of the wafer exchanging device. The exchanging device is therefore allowed to receive the disk 3 easily by vertical movement of the drive shaft. Thus, all the processes from the ion implantation to the wafer exchanging are automatically carried out. |
