发明名称 CHEMICAL RESISTANCE PLATING METHOD
摘要 PURPOSE:To form accurately a thermally stable high resistor on a printed circuit board by adding an Re salt to an Ni salt or a Co salt used in a chemical resistance plating method. CONSTITUTION:A resistor film is directly formed on an insulating board by chemical plating using a soln. contg. an Ni salt and/or a Co salt, an Re salt, a complexing agent, a reducing agent and a pH adjusting agent. For example, the plating is carried out at 83-87 deg.C for 10min using a plating soln. prepd. by adding an aqueous ammonia soln. to 0.1mol/l CoCl2, 0.0075mol/l KReO4, 0.5mol/ lsodium citrate and 0.5mol/l sodium hypophosphite so as to adjust the pH to 11.0. The resulting film has 20.07kOMEGA/? surface resistance value.
申请公布号 JPS59123759(A) 申请公布日期 1984.07.17
申请号 JP19820233037 申请日期 1982.12.28
申请人 SONY KK 发明人 MURAMOTO SHIYOUICHI;KIJIMA MITSURU;IWAZAWA TAKAO
分类号 H05K3/18;C23C18/16;C23C18/31;C23C18/40;C23C18/50;H05K1/16 主分类号 H05K3/18
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