| 摘要 |
PURPOSE:To obtain a convenient set-up means for heater offering sufficient auxiliary heating effects by providing a holding member for holding an flat object to be heated by gravity being in contact with it and a heating source arranged to be combined with and separable from said holding member for heating periphery or adjacency of periphery of the object to be heated. CONSTITUTION:A wafer 1 is held by its own gravity at four minute areas by four projections 34 of a holding member 3. When this wafer 1 is heated by light irradiation with light of a plane light source, or in advance of this irradiation, electric power to be applied to a heating source 2 is adjusted within a range 400-1,300W, for example, for lightening. Thus periphery 1c or adjacency of periphery 1b of the wafer 1 is auxiliarily heated in order that the temperature on periphery 1c of adjacency of periphery 1b of the wafer 1 becomes nearly same as that of pipe wall of the heating source 2 in the temperature zone over about 500 deg.C. By the auxiliary heating of the heating source 2, a difference of temperature between a central part 1a and the periphery 1c or the adjacency of periphery 1b becomes extremely small thereby making the overall temperature of the wafer 1 uniform. Accordingly, generation of warpage large enough to cause disorder in the following processes as well as ''slip line'' can be prevented. |
