发明名称 |
DEVELOPERS AND METHODS OF PROCESSING RADIATION SENSITIVE PLATES USING THE SAME |
摘要 |
A developer for processing image-wise exposed negative-working radiation sensitive plates based on organic solvent soluble diazo resins or certain photocrosslinkable resins or photopolymerizable olefinically unsaturated compounds includes a surfactant and a salt of an aliphatic carboxylic acid containing up to nine carbon atoms. The developer is substantially aqueous and has a reduced tendency to foam formation. It is useful in the photomechanical production of lithographic printing plates. |
申请公布号 |
DE3162627(D1) |
申请公布日期 |
1984.07.12 |
申请号 |
DE19813162627 |
申请日期 |
1981.01.23 |
申请人 |
VICKERS LIMITED |
发明人 |
BURCH, JEREMY RUSSEL;MURRAY, DAVID EDWARD |
分类号 |
G03F7/32;(IPC1-7):G03F7/26;G03C5/24;G03F7/08;G03F7/10 |
主分类号 |
G03F7/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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