| 摘要 |
PURPOSE:To enable the inspection of a pattern width near a point where the direction of the pattern changes or near the junction of the patterns irrespectively of the direction of the pattern by performing scanning of a circular mask at a min. reference value and a circular mask at a max. reference value. CONSTITUTION:A circular mask 2 at a min. reference value determined preliminarily from a design reference value is scanned with respect to a binary coding element 1 of a pattern which is an object to be inspected. If the two opposed points at the center and on the circumference is on the pattern, it is decided that the pattern has a point 3 of the pattern width smaller than the min. reference value when the diametrically opposed two points on the circumference orthogonal with the line connecting said two points and the center does not exist on the pattern. A circular mask 4 at a max. reference value is scanned with respect to the pattern 1 and it is decided that the pattern has a point 5 of the pattern width wider than the design reference value if all the points on said circular mask exist on the pattern. |
