| 发明名称 |
A method for producing a resist image involving the use of polystyrene-tetrathiafulvalene polymer as a deep-ultraviolet printing mask. |
| 摘要 |
<p>A polystyrene-tetrathiafulvalene (PSTTF)/polymer is used as a negative photoresist for forming a printing mask on a deep-ultraviolet sensitive polymer, such as polymethyl methacrylate.</p> |
| 申请公布号 |
EP0113034(A2) |
申请公布日期 |
1984.07.11 |
| 申请号 |
EP19830111768 |
申请日期 |
1983.11.24 |
| 申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
CHAO, VIVIAN WEI-WEN;KAUFMAN, FRANK BENJAMIN;KRAMER, STEVEN ROBERT;LIN, BURN JENG |
| 分类号 |
G03F7/26;G03F7/038;G03F7/095;G03F7/20;H01L21/027;(IPC1-7):03F7/10;03F7/02 |
主分类号 |
G03F7/26 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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