发明名称 |
Method of and apparatus for controlling an EDM process with successively displaced magnetic field |
摘要 |
An EDM method and apparatus wherein a localized magnetic field is produced so as to be concentrated at least predominantly on a region of the EDM gap which constitutes only a limited portion of a preselected entire area of juxtaposition between the tool and workpiece electrodes. The region of concentration of the localized magnetic field is successively shifted to sweep it over the entire area of juxtaposition between the electrodes. A control device is provided to control at least one parameter of production and sweeping of the localized magnetic field in response to at least one process parameter of the EDM process.
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申请公布号 |
US4459455(A) |
申请公布日期 |
1984.07.10 |
申请号 |
US19810259096 |
申请日期 |
1981.04.30 |
申请人 |
INOUE-JAPAX RESEARCH INCORPORATED |
发明人 |
INOUE, KIYOSHI |
分类号 |
B23H7/38;(IPC1-7):B23P1/08 |
主分类号 |
B23H7/38 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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