发明名称 DEVICE FOR SUPPLYING VAPOR DEPOSITING SPECIMEN
摘要 PURPOSE:To control easily the vapor deposition speed in flash vapor deposition by sliding two sheets of plates which are fixed at a prescribed spacing and the position of holes deviated at the top and bottom ends of a cylinder installed between the two plates so that a specimen can be supplied at a specified rate. CONSTITUTION:A titled device consists of cylinders 22 and cylinder 25 which are provided in the lower part of a hopper 21 and have roughly the same size in diameter as the size of a vapor deposition sample, an upper plate 23 and lower plate 23', and a driving mechanism 30 which drives forward and backward two sheets of the plates 23, 23'. Said cylinder 25 has roughly the same diameter as the diameter of the cylinder 22 and has the length necessary for contg. an amt. of the specimen to be supplied in one operation. The two plates 23, 23' sandwich the cylinder 25 and have holes 24, 24' deviated in position from each other. The specimen in the cylinder 22 is dropped through the hole 24 of the plate 23 into the cylinder 25 by the above-described driving mechanism. The specimen in the cylinder 25 is dropped through the hole 24' of the plate 23' and is supplied to a vapor deposition source 28.
申请公布号 JPS59118881(A) 申请公布日期 1984.07.09
申请号 JP19820228418 申请日期 1982.12.27
申请人 FUJITSU KK 发明人 KAWARADA MOTONOBU;HORIKOSHI EIJI
分类号 C23C14/24 主分类号 C23C14/24
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