发明名称 OPTICAL ALIGNING SYSTEM FOR TWO PATTERNS PROVIDED WITH GRID-TYPE ALIGNING MARKS, ESPECIALLY FOR DIRECT PHOTOREPEATING ON SILICON
摘要 Optical system for the automatic alignment of two motifs in which the alignment marks of a first fixed motif forming the reference are constituted by at least one pair of identical periodic optical gratings with a constant spacing P and having a predetermined distance dX from one another such that the equation dX=(n+ epsilon ) P is proved, n being an integer and epsilon a fraction of unity. An optical modulator, for example electro-optical means incorporating a Pockels cell alternately illuminate with the timing of the high frequency control signals, the said gratings in windows, whose position can be regulated in accordance with a given axis. The image of these windows is projected onto gratings carried on a second moving support to be aligned and produces orders of diffraction. An optoelectronic detector detects a predetermined order of diffraction. The high frequency-modulated output signals are transmitted to control circuits for producing the automatic alignment.
申请公布号 DE3068078(D1) 申请公布日期 1984.07.05
申请号 DE19803068078 申请日期 1980.12.17
申请人 THOMSON-CSF 发明人 LACOMBAT, MICHEL
分类号 G01B11/00;G03F9/00;H01L21/027;H01L21/30;(IPC1-7):G03B41/00 主分类号 G01B11/00
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