发明名称 RESIST FOR COLOR FILTER OF SOLID-STATE IMAGE PICKUP ELEMENT
摘要 PURPOSE:To obtain a resist for the color filter of a solid-state image pickup element having favorable spectral characteristics especially in a blue region by introducing specified photo-cross-linkable constituent units into part of a saponified product of polyvinyl acetate having a specified degree of saponification to improve the dyeability and to retard the progress of a dark reaction. CONSTITUTION:Photo-cross-linkable constituent units represented by formula I (where X is a group represented by formula II, CO2<-> or NH4<+>) are introduced into part of the principal chain of a saponified product of polyvinyl acetate having >=75% degree of saponification, and the resulting product is used as a resist for the color filter of a solid-state image pickup element. An aqueous soln. of the resist is coated on the transparent support layer of a solid-state image pickup element, prebaked, patternwise exposed through a mask, and developed to form a layer to be dyed, and the layer is dyed. The progress of a dark reaction in the resist after coating is retarded, the resist has high dyeability after development, and a filter having favorable spectral characteristics especially in a blue region and high clearness is obtd.
申请公布号 JPS59116651(A) 申请公布日期 1984.07.05
申请号 JP19820232521 申请日期 1982.12.23
申请人 TOSHIBA KK 发明人 MITA KATSUHISA;MIYAMURA MASATAKA
分类号 G02B5/20;G03F7/038 主分类号 G02B5/20
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