发明名称 Method of refining silicon tetrafluoride gas
摘要 SiF4 gas containing oxygen-containing silicofluoride(s) typified by (SiF3)2O as impurity can be refined to extremely high purity by making the SiF4 gas contact with HF in the presence of a liquid medium having strong affinity for water such as sulfuric acid or phosphoric acid. By reaction with HF, the impurity such as (SiF3)2O is converted to SiF4, while the liquid medium absorbs water formed by the reaction to thereby prevent a reverse reaction between SiF4 and H2O to form (SiF3)2O.
申请公布号 US4457901(A) 申请公布日期 1984.07.03
申请号 US19820405384 申请日期 1982.08.05
申请人 CENTRAL GLASS COMPANY, LIMITED 发明人 KITSUGI, NAOMICHI;FUJINAGA, TERUO;OTSUKA, TOYOZO
分类号 C01B33/02;C01B33/037;C01B33/107;(IPC1-7):C01B33/08;B01D53/34 主分类号 C01B33/02
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