发明名称 FIELD EFFECT TRANSISTOR
摘要 PURPOSE:To reduce the deterioration of noise figure bypassing the current in a superhigh frequency band by a method wherein a high concentration layer is formed on a semiconductor substrate in parallel with an active layer, and an electrostatic capacitor is added in parallel to a parasitic resistor. CONSTITUTION:The high concentration layer 8' to give electrostatic capacitance between the parasitic resistor existent between a source 2 and a gate 3 and a high concentration layer 6' and the high concentration layer 9' to give electrostatic capacitance between the parasitic resistor existent between the gat 3 and a drain 4 and a high concentration layer 7' are formed. Thereby, the current, when it is in the superhigh frequency band, comes to flow through the electrostatic capacitor between the parasitic resistor existent between the source 4 and the gate 3 and the high concentration layer 8' and through the electrostatic capacitor between the parasitic resistor existent between the gate 3 and the drain 4 and the high concentration layer 9', and the impedance by the electrostatic capacitance decreases, therefore the deterioration of noise figure due to the parasitic resistance can be reduced.
申请公布号 JPS59114870(A) 申请公布日期 1984.07.03
申请号 JP19820223823 申请日期 1982.12.22
申请人 HITACHI SEISAKUSHO KK 发明人 HASE HIDEKAZU;TAKASE MASAHIKO
分类号 H01L29/812;H01L21/338;H01L29/80;(IPC1-7):01L29/80 主分类号 H01L29/812
代理机构 代理人
主权项
地址
您可能感兴趣的专利