| 摘要 |
PURPOSE:To enhance luminance of panel display and improve luminance of light emission irrespective of the size of a display panel by purifying the surface of a substrate through the etching under the discharge plasma and forming a film of In series alloy in the specific thickness on the surface of said substrate. CONSTITUTION:The electrode 12 is deeply biased so that the substrate 13 is etched between the sputter etch electrodes 12 and 14 connected to the etch power supply 16 and the substrate surface is purified by plasma gas. Thereafter, the power supply 16 is released, the shutter is mechanically opened by a rotary shaft 15, and a metal film is formed on the substrate in the thickness of 1mum or more by the vaporization source 18 accommodating In series alloy or In series oxide and the electron beam power supply 19. Thereby, a thick conductive film of 1mum or more can easily be formed and a display panel ensuring high luminance of light emission can be obtained. |
