REACTIVE VAPOR DEPOSITION DEVICE

摘要

PURPOSE:To increase the content of the compd. in the film formed on the surface of a material to be plated without heating and holding said material by providing an excited gas supply device in a vacuum vessel, and converting a gas having at least one component in the compsn. of a compd. film as a constituting element into plasma then ejecting the plasma into the vapor particle group evaporated by a heater. CONSTITUTION:A reactive vapor deposition device is constituted of a material 1 to be plated on which a film of a compd. is to be formed, an evaporating material which is at least one component in the compsn. of the compd. film, and a heater 4 which evaporates the material 3 to vapor particles. An excited gas supply device 9 is further provided in a vacuum vessel 5 and the gas contg. at least one component in the compsn. of the compd. film as a constituting element is converted into plasma in the device 9. Such plasma is ejected from an ejection port into the vapor particle group evaporated by the heater 4.