发明名称 ELECTRON BEAM DEFLECTION UNIT FOR SCANNING ELECTRON MICROSCOPE
摘要 PURPOSE:To vary the deflection fulcrum position and enable use under the minimum conditions of various types of aberration in a wide focal length range by varying the ratio of the deflection of a two-stage deflection coil depending on the excitation intensity of the final step convergent lens. CONSTITUTION:First and second state deflection coils 1 and 2 are driven by separate deflection amplifiers 3 and 4. Deflection signals are applied to the deflection amplifier 3 through a magnification switching circuit 6 and a variable gain width circuit 5 is inserted between the deflection amplifier 4 and magnification switching circuit 6. A final step convergent lens 10 is excited by a lens power supply 7 and the excitation current value can be varied by a focal point coarse adjustment switch 8 and a focal point fine adjustment potentiometer 9. The gain of the variable gain amplifier 5 is switched by a switch 8' that is switched interlocking with the focal point coarse adjustment switch 8 and the output current ratio I2/I1 of the deflection amplifier is varied interlocking with the exciation current value of the final step convergent lens, that is, the focal point.
申请公布号 JPS59112556(A) 申请公布日期 1984.06.29
申请号 JP19820220252 申请日期 1982.12.17
申请人 HITACHI SEISAKUSHO KK 发明人 YAMADA OSAMU
分类号 H01J37/147;H01J37/21;H01J37/28 主分类号 H01J37/147
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