| 摘要 |
PURPOSE:To control the reflectivity or transmittivity of a disk to a specific value by reading the quantity of reflected or transmitted light from a grooved board, measuring the quantity of light in-process of vapor deposition, and finishing the vapor deposition when a specific quantity of light is obtained. CONSTITUTION:The vapor deposition to the grooved board 21 is specified by opening or closing a shutter 34. A recording film is deposited on not only the grooved board 21, but also the head 35 of a crystal oscillator film thickness gauge, which controls the speed of the vapor deposition. The grooved board 21 which rotates on its axis is irradiated with a specific quantity of light as shown in a figure and the quantity of reflected light is detected by a photodetector 37. When a material consisting principally of a thin film of low oxide of tellurium TeOx (0<x<2) is used for the recording film, recording/reproduction characteristics are high within a 110-130nm film thickness range. The reflectivity of the disk including the grooved board and recording film is measured in process of the vapor deposition by said method and it is confirmed by the crystal oscillator film thickness gauge that specific reflectivity is obtained and the thickness of the recording film is between the range 110-130nm, finishing the vapor deposition. |
