VAPOR DEPOSITION METHOD USING ELECTRON BEAM

摘要

PURPOSE:To carry out vapor deposition using electron beams with high productivity of films by controlling the output of an electron gun so that the starting material holder is kept at the evaporation temp. of a starting material to be vapor-deposited to a temp. below the evaporation temp. of the holder. CONSTITUTION:The temp. of a starting material holder made of Ta or the like, that is, a vapor deposition boat 2 is detected with a thermocoupler 3 or the like. The supply of electric current to the filament 4 of an electron gun for generating electron beams is controlled to control the output of the gun so that the boat 2 is kept at the evaporation temp. of a starting material to be vapor-deposited such as Au to a temp. below the evaporation temp. of the boat 2. By this method the productivity of films can be improved even when the starting material held in the boat is only a small amount or has high heat conductivity.