发明名称 CORRECTING METHOD OF PHOTO-MASK FAULT AND DEFECT
摘要 PURPOSE:To correct the fault and defect easily in a short time by partially heating the position of the fault and defect of the photo-mask by laser beams and vapor-phase growing metal chromiun at the position. CONSTITUTION:A gas 6 required for vapor-phase growing metal chromium is fed into a chamber 5, and laser beam 7 are irradiated to the arbitrary surface position of the photo-mask 3 set up. When laser beams 7 are irradiated to the broken defect 4 and the broken defect 4 and a section in the vicinity of the defect are heated at 600 deg.C or more, the vapor-phase growth gas 6 in the chamber 5 reacts, metal chromium 8 vapor-phase grows at the position of the fault and defect 4, which is repaired, and the defect as the photo-mask 3 is corrected.
申请公布号 JPS59105320(A) 申请公布日期 1984.06.18
申请号 JP19820215731 申请日期 1982.12.08
申请人 SANYO DENKI KK 发明人 SHIRAKAWA AKIRA
分类号 G03F1/00;G03F1/72;H01L21/027 主分类号 G03F1/00
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