| 摘要 |
PURPOSE:To simplify the constitution of a device, and to miniaturize the device by each evaluating at least two chip patterns of a photo-mask to be inspected and chip patterns in the same number of a standard photo-mask, mutually comparing the values, calculating the correlation of each defect obtained and computing a common defect. CONSTITUTION:Two chip patterns of the photo-mask 2 to be inspected are pattern-detected by a pattern detecting means 10 while two corresponding chip patterns of the standard photo-mask 3 are detected by a pattern detecting means 11. Each pattern is each changed into binary-coded signals in binary-coding converting sections 13, 14, and inputted to a mutual comparison section 15. Binary- coded pattern signals are compared one by one by the photo-mask to be inspected and the standard photo-mask, a section where both are not conformed, a defect section, is outputted to an arithmeic means 16 as its coordinate, and memorized to a micro-computer 17. Accordingly, each defect of the chip patterns in compared number can be detected by their coordinates. |
