发明名称 APPARATUS FOR SUPPLYING RAW MATERIAL FOR VAPOR DEPOSITION
摘要 PURPOSE:To obtain the titled apparatus of simplified structure which can certainly supply the predetermined amount of a raw material for vapor deposition, by adopting the constitution that said raw material for vapor deposition is melted with heat above its melting point but below its evaporation point by a heating part and then supplied through a controller for the delivery of a raw material to an evaporating part. CONSTITUTION:Piping 4 for introducing a raw material 2 for vapor deposition in a housing part 1 to an evaporation source 3 is connected to the housing part 1, and the raw material 2 for vapor deposition is held at a temp. above its melting point but below its evaportion point by a heating controller part through a heating part 5. A controlling part for the delivery of a raw material is constituted by forming a tapered part 7 at the interior of the middle of said piping 4, inserting a steel ball 8 as a spherical magnetic body therein, and providing electromagnets 9, 10 each connected to a separate current-applying circuit. In the aforementioned constitution, the steel ball 8 is moved leftwards by the driving of the electromagnet 10 to open the passage of the piping 4, or the steel ball 8 is brought rightwards into close contact with the taper 7 by the electromagnet 9 to plug the passage. Thus, the supply of the raw material 2 for vapor deposition or its suspension is rapidly certainly controlled.
申请公布号 JPS59104473(A) 申请公布日期 1984.06.16
申请号 JP19820212348 申请日期 1982.12.03
申请人 NIPPON DENSHIN DENWA KOSHA 发明人 FUJIWARA KOUICHI;TSURUMI SHIGEYUKI;TAKEUCHI YOSHIAKI
分类号 C23C14/24 主分类号 C23C14/24
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