| 摘要 |
PURPOSE:To contrive to enhance sensitivity to an electron beam and X rays, and to contrive to enhance productivity of a fine pattern by a method wherein a heat-treating process is executed at the middle between a high energy beam irradiating process and a developing process. CONSTITUTION:A resist solution is coated on a substrate 2, and then, drying by heating is performed to form a resist film 1. A high energy beam 3 is radiated on the resist film 1 to draw a pattern, and moreover, the sample is heat- treated. Then by performing development using a developer, a fine pattern is formed. When rebonding is thermally checked completely, and a reaction according to irradiation of the high energy beam is utilized to the maximum in such a way, sensitivity can be enhanced. |
