| 摘要 |
PURPOSE:To obtain a long life plasma apparatus which generates little dust by covering the surface of electrodes provided within the reaction chamber with a metal or metal oxide which is thermally stable and assures easy vaporization of halogenide. CONSTITUTION:An object to be processed 5 is placed facing the electrode opposing to the electrode 5 in the parallel flat type reactive ion etching apparatus. At least the surface of both electrodes is made of Mo, W, Ti or the oxide of them, generation of dust can be reduced and manufacturing accuracy can be improved in comparison with the existing carbon or polytetrafluoroethylene. |
