| 摘要 |
PURPOSE:To correct a defective part by storing defect of mask pattern detected to a memory medium, reproducing a corresponding defect of mask pattern by such data and selective irradiating the relevant area with light. CONSTITUTION:A mask inspection and correction apparatus is constituted of a controller 1 containing a memory device, a mask inspection apparatus 2, an exposing apparatus 3 which operates as a part of pattern correction apparatus, a controller 4 and an etching apparatus 5 which also operates as a part of the pattern correction apparatus. The apparatus 2 thus formed is further provided with an XY scanning stage 14 which places in parallel a pair of masks 13, an optical system consisting of an objective lens 17 and an eyepiece 18 and a linear encoder 21 which reads inspection position. Detected defect is then produced by the apparatus 3 and it is stored to a cassette tape 38 in the apparatus 4. The defect of mask 13 is corrected by the apparatus 5 based on such stored data. |
