Process for regenerating an iron chloride/copper chloride etching solution

摘要

A process is proposed for regenerating an iron chloride/copper chloride etching solution in which the etching solution is separated at least into two flows. One of the flows is fed to the zone between the cathode and the anode, which is made of a porous material permeable to atomic chlorine, at a velocity which ensures a laminar movement of the etching solution over the surface of the electrodes. The second flow is fed into the zone behind the anode at a velocity which ensures a turbulent movement of the etching solution over the anode surface. In this process, the ions of the divalent copper are electrochemically reduced to metallic copper at the cathode, and at the anode the ions of the divalent iron are oxidised to those of trivalent iron and the chlorine ions to atomic chlorine. The latter diffuses through the pores of the anode into the zone behind it and oxidises the ions of the divalent iron.