| 发明名称 |
PROCESS FOR TRANSFERRING ONTO A SUPPORT THE TRUE SHADOW OF A MASK PIERCED WITH REGULARLY DISTRIBUTED SLITS, AND APPLICATION OF THIS PROCESS TO PHOTOLITHOGRAPHY IN PARTICULAR |
| 摘要 |
<p>A process is disclosed which consists of choosing the wavelength of a plane incident wave to lie in the range 2d/3</= lambda </=2d, where d is the pitch of the slits so that there exist only two diffracted orders for each of the two half-spaces which are situated on each side of the plane of the mask, and in adjusting the angle of incidence of the plane wave so that the reflected diffracted order which is not the specularly reflected order is propagated in the direction opposite that of the incident wave.</p> |
| 申请公布号 |
EP0025380(B1) |
申请公布日期 |
1984.06.13 |
| 申请号 |
EP19800401211 |
申请日期 |
1980.08.25 |
| 申请人 |
ROUMIGUIERES, JEAN-LOUIS |
发明人 |
ROUMIGUIERES, JEAN-LOUIS;NEVIERE, MICHEL |
| 分类号 |
G03B27/04;G02B27/42;G03F7/20;G03F9/00;H01L21/027;(IPC1-7):03F7/20 |
主分类号 |
G03B27/04 |
| 代理机构 |
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代理人 |
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| 主权项 |
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