发明名称 Process for fabricating integrated optics.
摘要 <p>A process for making a diffraction grating pattern (15) on a substrate (1) is disclosed. The process comprises the steps of coating the substrate (1) with first and second materials (10,11) with one of the materials (10, 11) defining a selected area for the diffraction grating pattern, and the other material covering the substrate while forming a window (A) at that portion of the substrate where the diffraction grating is desired. The window (A) portion of the substrate is then eteched, and the first and second materials (10, 11) are stripped off in order to leave behind the diffraction grating pattern (15) at the desired location of the substrate.</p>
申请公布号 EP0110184(A1) 申请公布日期 1984.06.13
申请号 EP19830110986 申请日期 1983.11.03
申请人 SUMITOMO ELECTRIC INDUSTRIES LIMITED 发明人 OKAMATO, KENJI OSAKA WORKS OF;NISHIWAKI, YOSHIKAZU OSAKA WORKS OF;MATSUOKA, SHUNJI OSAKA WORKS OF;NISHIURA, YOZO OSAKA WORKS OF
分类号 G02B6/124;(IPC1-7):02B5/18 主分类号 G02B6/124
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