| 摘要 |
PURPOSE:To analyze quantitatively and exactly a sample containing multilayered components in the depth direction by providing a substrate in a region which doesn't interfere with spectral diffraction at a position of about 2mm. above a cathode, and measuring an electric resistance of vapor-deposited metallic atoms. CONSTITUTION:The substrate 14 for depositing the vapor of the metallic atoms is fixed to the position of about 2mm. above the sample 1 by conducting wires 15, 16 flowing a current which are formed at the outer part by vacuum sealing with a third insulator 4. When the metallic sample 1 is set, an inner part of a discharging space 13 is evacuated by gas ventillation pipes 10, 11 to introduce gaseous argon into the space 13, and high voltage is impressed between a first electrode 2 and the cathode 8. By measuring the electric resistance of the deposited metallic atoms, the analysis in the depth direction of the sample containing multilayered components can be performed quantitatively and exactly. |
