| 摘要 |
This invention relates to a structure of a registration mark for electron beam exposure technique. The mark comprises a lower metal film formed on a semiconductor substrate such as GaAs substrate having high electrical resistivity, and a upper metal film formed on the lower metal film and having a raised or indented crisscross shape. A connecting portion is connected electrically to the lower metal film and extends on the substrate. According to this structure, charge that has been built up in the registration mark by many scanning actions can be discharged through the connecting portion and hence, accurate registration is possible. |
