| 摘要 |
PURPOSE:To obtain the titled element hardly causing short circuit between electrodes by forming an electrically insulating film specified in thickness on a transparent electrode formed on a substrate. CONSTITUTION:The first <=50nm thick insulating layer 6 is deposited on a desirably patterned transparent electrode 2 formed on substrate 1. This layer 6 is coated with a photoresist 7 and exposed to form a photoresist layer 7 patterned only on the part in which an electrochromic layer is to be deposited. After the second >=50nm thick insulating 8 has been formed on the whole surface of the substrate 1, the photoresist layer 7 is removed, resulting in leaving the <=50nm thick insulating layer 6 in the part to be occupied by the electrochromic layer and the >=50nm thick insulating layer in the part not to be occupied by said layer. Then, at least one of the electrochromic layer 3 and at least one of a solid electrolyte layer 4 are laminated on said substrate 1, and an opposite electrode 5 is formed on the layer 4. |
