| 摘要 |
PURPOSE:To obtain a thin air electrode which can be subjected to heavy load discharge over a long period and has an excellent preservation performance by forming a thin film of a metal oxide having a rutile-type crystal structure on the gas-side surface of a porous electrode base by vapor deposition or sputtering. CONSTITUTION:A thin film of a metal oxide having a rutile-type crystal structure is formed on the gas-side surface of a porous electrode base having both a current collecting function and the ability to electrochemically reduce oxygen gas by vapor deposition or sputtering. For instance, after a Raney-nickel plate (200mum thickness) having a means hole diameter of 5mum and a porosity of 80% and used as an electrode base is set on a sputtering device, a thin film of a metal oxide having a rutile-type crystal structure such as SnO2 or TiO2 is formed on one surface of the Raney-nickel plate by using the metal oxide as a target. Following that, the thus obtained plate is subjected to cathodic polarization by immersing it in 2% palladium chloride solution so as to deposit palladium in a thickness of about 0.5mum over the entire surface of the plate including the holes of the Raney-nickel plate. |
