| 发明名称 |
A PHOTOMASK FOR, AND A METHOD OF, PRODUCING SEMICONDUCTOR DEVICES |
| 摘要 |
A photomask comprises a transparent substrate on one surface of which a mask pattern is formed of a photoshielding film and the opposite surface of which is roughened in order that rays of incident light are refracted diffusedly through the rough surface and the images of minute particles of dust disappear in the projected pattern. |
| 申请公布号 |
DE3163315(D1) |
申请公布日期 |
1984.05.30 |
| 申请号 |
DE19813163315 |
申请日期 |
1981.10.22 |
| 申请人 |
FUJITSU LIMITED |
发明人 |
ARAIHARA, SATOSHI |
| 分类号 |
G03F1/60;G03F7/26;H01L21/027;H01L21/308;H01L21/467 |
主分类号 |
G03F1/60 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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