| 摘要 |
PURPOSE:To improve the accuracy of the optimum matching position as well as the production yield by providing plural sets of matching patterns to both a conductor pattern layer C and a ''Permalloy'' pattern layer P respectively and disposing the matching pattern shifting by a different degree from the center position of the matching pattern with the layers C and P for each set of both pattern layers. CONSTITUTION:It is supposed that the optimum matching position obtained from the evaluation of the integrated working characteristics of a finished element shifts by +0.2mum and -0.2mum in directions X and Y respectively to a designed center position. In such a case, a matching pattern G is used with the matching operation at a subsequent production. The pattern G is already shifted in the design stage to the directions X and Y by -0.2mum and +0.2mum respectively. As a result, the shift degree is substantially compensated by obtaining the coincidence between the center positions of matching patterns of both layers C and P. Thus the optimum matching is possible as desired. In such a way, it is possible to improve both accuracy of matching position and production yield for a magnetic bubble storage element. |
