发明名称 METHOD AND DEVICE FOR SETTING CLEARANCE BETWEEN SUBSTRATE AND MASK
摘要 PURPOSE:To set securely a titled clearance and to improve the yield of a product and working efficiency by pressing a mask to the conductive thin film of a substrate, and positioning both in parallel then moving the mask parallel in the direction where it separates from the substrate. CONSTITUTION:Conductive thin films 4a, 4b, 4c are provided by a vacuum deposition method, etc. in the position below a substrate 4 (on the side of a shielding mask 3a) where the circumference in the peripheral part is trisected. The mask 3a is first moved by a driving means 38, and the contact of the mask 3a with the films 4a, etc is detected by a detection means 39. A control device 36 stops a control motor 33a, etc. upon receiving of the detection signal from the means 39, thereby positioning the substrate 4 and the mask 3a in parallel. The device 36 operates the motor 33a, etc. simultaneously to move the mask 3a in parallel by the set value indicated by a clearance setter 37, thereby setting the prescribed clearance.
申请公布号 JPS5993873(A) 申请公布日期 1984.05.30
申请号 JP19820201932 申请日期 1982.11.19
申请人 HITACHI SEISAKUSHO KK 发明人 KUBOTA HITOSHI;TANAKA MINORU;AIUCHI SUSUMU
分类号 C23C14/04 主分类号 C23C14/04
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