发明名称 |
Process for the pretreatment of photographic substrates |
摘要 |
In a process for the pretreatment of photographic substrates in order to improve adhesion during subsequent coating with photographic emulsions, the corona discharge is carried out under a reduced pressure in order to treat the substrate, resulting in an improvement in the adhesion and wettability which lasts over a long period as well as a reduction in the residual charges generated or left on the substrate by the corona discharge.
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申请公布号 |
US4451497(A) |
申请公布日期 |
1984.05.29 |
申请号 |
US19820410137 |
申请日期 |
1982.08.20 |
申请人 |
AGFA-GEVAERT AKTIENGESELLSCHAFT |
发明人 |
DOLEZALEK, FRIEDRICH;KOEPKE, GUENTHER;RENDELMANN, ULRICH |
分类号 |
G03C1/74;B29C59/12;C08J7/00;G03C1/91;(IPC1-7):B05D3/06;B05D7/04 |
主分类号 |
G03C1/74 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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