发明名称 Process for the pretreatment of photographic substrates
摘要 In a process for the pretreatment of photographic substrates in order to improve adhesion during subsequent coating with photographic emulsions, the corona discharge is carried out under a reduced pressure in order to treat the substrate, resulting in an improvement in the adhesion and wettability which lasts over a long period as well as a reduction in the residual charges generated or left on the substrate by the corona discharge.
申请公布号 US4451497(A) 申请公布日期 1984.05.29
申请号 US19820410137 申请日期 1982.08.20
申请人 AGFA-GEVAERT AKTIENGESELLSCHAFT 发明人 DOLEZALEK, FRIEDRICH;KOEPKE, GUENTHER;RENDELMANN, ULRICH
分类号 G03C1/74;B29C59/12;C08J7/00;G03C1/91;(IPC1-7):B05D3/06;B05D7/04 主分类号 G03C1/74
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