| 摘要 |
<p>PURPOSE:To manufacture a thin film filter and to improve the optical characteristics of the filter by repeating a stage for selectively exposing a photosensitive film through a photomask and a stage for dyeing the unexposed parts. CONSTITUTION:A photosensitive film on a glass substrate 1 is excessively exposed through a photomask having a required pattern, it is uniformly exposed to a proper quantity of light to form parts having different degrees of polymn., and an excess of ammonium dichromate is removed by washing. After postbaking the film, only the parts not subjected to the 1st exposure are dyed with a coloring agent having prescribed spectral characteristics such as a dye to form a dyed pattern 15 having the 1st color. At this time, the excessively exposed regions 10 having a higher degree of polymn. are not dyed because dyeing groups are lost. A photosensitive liq. is then uniformly applied and dried, and similar processing is carried out to successively form patterns consisting of parts 21, 26 dyed with the 2nd and the 3rd dyes, respectively. A top coat 27 is finally coated to manufacture a color filter.</p> |
