| 摘要 |
PURPOSE:To perform both measurement inspection and matching inspection using one kind of cell by a method wherein a measurement cell is formed in square framelike shape, and the measurements of the frames are deviated corresponding to the mask so that the frames are formed without overlapping with each other. CONSTITUTION:Measuring patterns 15-17 are formed into square frame shape in such a manner that the center position of each frame will be in coincidence with each other. Also, the length of a side of said frames is to be increased from the pattern 15 toward the pattern 17, and when each of them is printed on the wafer, each of patterns 15A-17A is not overlapped with each other, and they are constituted in such a manner that gaps 18A and 19A are formed between each pattern. The patterns 15A-17A are formed on the patterns 15-17 in such a manner that their lower side will be in parallel with X direction and their right and left sides will be in parallel with Y direction, the outside measurements of the X or Y direction of the patterns 15A-17A are compared with the outside measurements of the patterns 15-17 using a pattern recognition device, thereby enabling to detect the accuracy of measurements. |
