发明名称 ION SPUTTERING DEVICE
摘要 PURPOSE:To dcrease the damage on a sample and to perform uniform coating by disposing a cylindrical cathode target, via an insulator, in a cylindrical anode, and disposing a sample and the target in proximity to each other so that the coating surface of the sample is positioned at right angles to the target surface. CONSTITUTION:Cylindrical auxiliary electrodes 11 are disposed on top and bottom of a cylindrical cathode target 5 and are fixed in a cylindrical anode 12 by means of an insulation support 13. A sample base 7 is placed on an insulation bese 8 and is disposed near the target 5. A sample 9 is placed on the base 7 so that the surface of the sample 9 is positioned at right angles to the surface of the target 5. When an electric discharge is generated between the target 5 and the anode 12 by a DC voltage power source 10, discharge plasma is formed between the surface of the target 5 and the anode 12 and a positive ion heads toward the target 5 and coats the surface of the sample 9 with the generated target metal. The electron and negative ion head toward the anode 12 and the thermal and mechanical damage of the sample 9 by the bombardment of the ion is extremely decreased.
申请公布号 JPS5989770(A) 申请公布日期 1984.05.24
申请号 JP19820199328 申请日期 1982.11.12
申请人 HITACHI SEISAKUSHO KK;HITACHI NAKA SEIKI KK 发明人 KATAGIRI SHINJIROU;AKAHORI HIROSHI;UNNO YOSHIMASA;ISHIIZUMI YUTAKA
分类号 C23C14/34 主分类号 C23C14/34
代理机构 代理人
主权项
地址