| 摘要 |
PURPOSE:To provide electrostatic chargeability and charge holding property, high photosensitivity and longer life by successively laminating a layer for preventing injection of electric charge consisting of boron nitride, photoconductive layer consisting of a non-single crystalline silicon atom-contg. film and surface layer consisting of boron nitride. CONSTITUTION:After a drum-shaped base body 12 is set to a supporting bar 16, the inside of a reaction vessel 11 is maintained under a prescribed gaseous pressure and the base body is heated to a prescribed temp. While the specified gaseous pressure is maintained, the required electric power is impressed between the base body 12 and a cylindrical electrode 18 by a high-frequency power source 17 for the prescribed time to form the film 24a for preventing injection of electric charge. The film of the photoconductive layer 24b is formed on the layer 24a in succession thereof while the film forming conditions such as the temp. of the body 12, the gas to be introduced, electric energy and the time for impressing the electric power are reset to prescribed values in the same reaction vessel 11. The respective film forming conditions are reset to prescribed conditions and the surface layer 24c is formed on the layer 24b in the same vessel 11, by which the formation of a photosensitive body 24 is completed. |
