| 摘要 |
An adherent chromium deposit is obtained on a substrate by means of a process which involves applying an adherent iron containing deposit to the substrate, anodic treating the iron containing deposit and depositing chromium on the treated, iron containing deposit from a bath containing a halogen releasing compound selected from the group consisting of iodine releasing compounds, bromine releasing compounds and mixtures thereof. Supplemental catalysts such as sulfates, simple and complex fluorides, borates, carboxylates, chlorides, chlorates and perchlorates can also be present. The process can further include the step of activating the substrate in an acid bath or an iron or an iron alloy plating bath prior to iron plating from an iron salt containing bath.
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